职责描述: 1.负责化学机械研磨和电化学无应力抛光设备测试研发和创新; Responsible for CMP and electrochemistry test, research, development and innovation; 2.负责化学机械研磨与无应力抛光设备集成的测试,研发和创新; Responsible for CMP and SFP integrated process test, research, development and innovation; 3.负责机台日常维护测试,测试和可靠性测试; Responsible for tool daily maintenance,test and reliability test; 4.负责设备相关技术文献检索,分析和撰写; Responsible for relevant technology document search, analysis and writing; 5.与机械,电气,软件工程师合作,负责机台设计,评估,测试,和改进 Responsible for coworking with mechanical, electrical, software engineers to support tool design, evaluation, test, and improvement; 6.与客户合作,安装,调试,验收机台以及维保 Cooperate with customer to install,evaluate,qualify tool and maintenance,service. 任职要求: 1. 5-8年CMP先进封装FAB、或设备厂商设备工作经验; 5~8years working experience in related field such as CMP equipment in FAB or in an advanced packaging factory or tool vendors; 2. 熟悉化学机械研磨CMP设备研磨和清洗原理,了解inline/offline工艺, Be familiar with the principle of chemical mechanical polishing (CMP) equipment polishing and cleaning,understand the inline/offline processes. 3. 具有一定项目管理能力; Good project management ability; 4. 硕士或本科,理工科相关专业; Master or bachelor degree, major in science &technology or mechanical; 5. 擅长沟通并能适应一定程度加班; Good at communication and for overtime work to complete tasks on time. 6. 有先进工艺节点经验优先 Experience in advanced process technology is preferred.
盛美成立于2005年,是注册于上海浦东新区张江高科技园区的外资企业,已于2017年正式登陆美国纳斯达克。盛美集研发、设计、制造、销售于一体。由王晖博士带领的团队开发出了具有世界领先的全球专利保护的单片SAPS,TEBO兆声波技术,高温硫酸清洗技术,以及电镀铜,电抛光技术。王晖博士毕业于清华大学精密仪器系,获得日本大阪大学精密工学科博士学位,并作为海外高层次归国创业人才入选了国家“千人计划”。盛美主要产品有兆声波单片清洗设备,TEBO,背面清洗设备,无应力抛铜设备,TSV深孔清洗设备,干法刻蚀设备,涂胶机,显影机,去胶机,腐蚀机,薄片清洗机,高温硫酸清洗设备,Ultra C Tahoe等。公司具有高新技术企业资质,承担十一五国家科技重大专项和十二五国家科技重大专项的研发。盛美是国内单片清洗设备的最大供应商,现有8,600平米的制造车间,产能50台各种设备/年,可扩张至100台/年。去年实现销售2.4亿元,今年预计有望实现销售成长90%,创历史新高。